PVD Technology

FAR_100

The equipment FAR_100 is especially suitable for the pilot production, for the research and development or to start up an efficient coating mini center.
The dimensions of FAR_100 are small, but thanks to the precise design of its table, FAR_100 is able to load an high quantity of pieces for a volume of just 100 liters. With FAR_100, you can coat 90 milling of diameter 10 and 140 mm high. FAR_100 can be converted in a PACVD or PECVD equipment adding a plasma source (DC, RF or microwave) or radio frequency bias to coat with DLC or SiOx and i suitable for the research or small pilot production.

Characteristics of the equipment

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FAR_300

The Equipment FAR_300 is suitable for medium-high production.
The productivity of the equipment FAR_300,   deposition chamber volume being equal, is one of the highest in the market. In 50 liters volume, it is possible to coat 100 milling whereas the necessary volume of the competitors is 100 liters. Thanks to its extratable table,  the stopping time is reduced at the minimum.
On demand of the customer, the equipment can be deliver with a plasma source or a magnetron evaporator.

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Characteristics of the equipment

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Evaporator FAR_EVA_63

The electromagnetic arc evaporator has been designed by FarCoat s.r.l. in order to obtain a coating of higher quality.
This evaporator is usually installed on the equipment FAR_300 and FAR_100, but it could supplied separately.
A monophase current generator with a control card designed by FarCoat coud be supplied coupling with the evaporator.

Characteristics of the equipment

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